High Frequency RF Power Supplies

High Frequency RF Power Supplies

Our High Frequency RF Power Supplies are designed to meet the performance demands in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering, PECVD, and solar photovoltaic applications. Additional applications include induction and dielectric heating processes in industrial systems. These single frequency RF power supplies operate in the HF band (3.39MHz to 30MHz) and are typically provided in small, desktop-sized units.

 

Applications
The CB series is designed to meet the performance demand in RF-driven plasma systems for semiconductor processing. Applications include etch, ICP, RF sputtering and PECVD, as well as induction and dielectric heating processes in industrial systems, and solar photovoltaic applications.

Typical features

  • Small, lightweight packaging
  • Standard fixed frequencies: 3.39 MHz to 30 MHz
  • Patented S-Technology provides ultra-stable output. This stabilizing technology optimizes amplifier performance, reducing power-gain changes caused by plasma impedance fluctuations.
  • Designed to meet ETL and SEMI F47 directives
  • Forward or Delivered power mode regulation​

 

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