Brooks GP200 Series Pressure Mass Flow Controller
All of the performance
  • Brooks GP200 Series Pressure Mass Flow Controller
  • GP200 Pressure MFC topical conversation on YouTube
  • All of the performance
  • Specification for GP200

Brooks GP200 Series Pressure Mass Flow Controller

All pressures, all gases, all processes.

Traditional pressure-based MFCs require high inlet pressures to operate. Not GP200 Series - the laminar flow element was designed for low pressure drop and the differential pressure sensor is optimally ranged enabling accurate flow measurement of challenging low vapor pressure process gases used in semiconductor manufacturing.

 

This exclusive architecture makes GP200 Series a universal P-MFC solution suitable for both standard pressure and critical low vapor pressure gases, ensuring accuracy and repeatability under all operating conditions.

  • 35 psia is the typical inlet pressure specification for GP200 Series, but can be configured either higher or lower, depending on your specific application
  • Designed to support critical low-pressure process gases including:

    • BCl3

    • C4F6-q

    • C4F8

    • SiCl4

  • Cross Talk Insensitive ≤ ±1% of setpoint up to 40 psi/sec inlet pressure spikes ‚Äč

 

Enquire about this Product

One true differential pressure sensor. Superior flow measurement accuracy and repeatability.

One true differential pressure sensor. Superior flow measurement accuracy and repeatability.

Traditional pressure-based MFCs use two absolute pressure sensors to compute pressure drop. GP200 Series uses a novel sensor approach – an integrated assembly of one absolute pressure sensor in tandem with a true differential pressure (ΔP) sensor.

 

  • Eliminates the need to hold matched calibration and temperature compensation across two separate absolute pressure sensors
  • Prevents uncontrolled drifts and flow inaccuracies
  • Enables superior long-term stability

 

Zero leak-by control valve eliminates first wafer effect.

Zero leak-by control valve eliminates first wafer effect.

When a gas leak-by occurs across the MFC control valve, it causes unwanted pressure build-up at the downstream pneumatic isolation valve, resulting in the formation of a trapped volume of gas.

 

When a new recipe sequence is initiated, this trapped volume of gas goes into the process chamber, causing non-uniformities and Critical Dimension (CD) defects on the first wafer, known as first wafer effect. Process engineers avoid the first wafer effect by either running a dummy wafer or diverting the flow into exhaust prior to processing the wafers.

An optional zero leak-by control valve with an engineered PCTFE sealing surface delivers improved valve shutdown to eliminate first wafer effects:

  • <0.005% FS for bins 42-46
  • <0.02% FS for bins 40-41

 

WHITE PAPER

A New Differential Pressure Sensor Based MFC for Advanced Semiconductor Processing

Learn how use of a differential pressure sensor instead of discrete pressure sensors combined with locating the control valve downstream of the laminar flow element in the new GP200 Series P-MFC delivers obvious advantages in flow measurement accuracy and repeatability over traditional P-MFCs.

White Paper

This site uses cookies. By continuing your visit, you accept their use as set out in our Cookie Policy. Accept All CookiesCookie Preferences